Simulation of Etching Process Using Statistical Method

통계적 기법을 이용한 에칭공정의 시뮬레이션

The objective of this study is to simulate the etching characteristics under different process parameters for the optimization of etching process. The etching characteristics such as the etching factor were investigated under different operating conditions and compared with the spray characteristics. The spray characteristics were measured by using Phase Doppler Anemometer. The correlation between the etching characteristics and the spray characteristics was analyzed to simulate the etching characteristics under the actual parameters of the etching process. The parameters were distance of nozzle tip and pipe pitch. To improve the uniformity and value of etching factor in the etching process, the process parameters should be designed optimally. The distribution of spray was simulated by the Monte-Carlo Method and the process parameters were optimized by the design of experiments(DOE).