한국정보디스플레이학회:학술대회논문집
- 2004.08a
- /
- Pages.1038-1039
- /
- 2004
Photolithography Process of Organic Thin Film with A New Water Soluble Photoresist
- Kim, Kwang-Hyun (TFT-LCD National Lab. & Dong-A Univ., Div. of Electrical & Electronics & Computer Eng.) ;
- Song, Chung-Kun (TFT-LCD National Lab. & Dong-A Univ., Div. of Electrical & Electronics & Computer Eng.)
- Published : 2004.08.23
Abstract
We developed a new photoresist which was composed of polyaniline, uv-curing agent, N-methyl-2- pyrrolidine (NMP) and N-Butyl alcohol (BuOH) as solution. The photoresist is characterized by the capability of being developed in water. We successfully patterned pentacene thin film, which was vulnerable to organic solvent and thus could not be patterned by the conventional photolithography process, with the water soluble photoresist and the minimum feature size was found to be 2um.
Keywords