The effect of abrasive size on uniformity in CMP process

연마입자 크기가 CMP 공정의 연마균일도에 미치는 영향

  • Ahn Jin-Woo (Department Material Science and Engineering, Korea Univ.) ;
  • Cho Byun-Gjick (Department Material Science and Engineering, Korea Univ.) ;
  • Lim Dae-Soon (Department Material Science and Engineering, Korea Univ.) ;
  • Park Hyung-Soon (Memory Research & Development Division, Hynix Semiconductor Inc.) ;
  • Shin Jong-Han (Memory Research & Development Division, Hynix Semiconductor Inc.)
  • Published : 2004.11.01