Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2004.07b
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- Pages.849-852
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- 2004
Characteristics of ITO Thin Films on Polymeric Substrates with Oxygen Partial Pressure Ratio
산소분압비에 따른 고분자 기판 상에 ITO박막의 특성
- Kim, H.H. (Doowon College) ;
- Lee, Mu-Yeong (Doowon College) ;
- Kim, K.T. (Doowon College) ;
- Yoon, S.H (Doowon College) ;
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Park, D.H.
(Wonkwang Univ.)
;
- Park, C.H. (Chungbuk Univ.) ;
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Lim, K.J.
(Chungbuk Univ.)
- Published : 2004.07.05
Abstract
Indium tin oxide (ITO) thin films on polymeric substrates such as acryl (AC), Poly carbornate (PC), polypropylene (PP), and polyethlene terephthalate (PET) have been deposited by a do reactive magnetron sputtering without heat treatments. Sputtering parameters is an important factor for high Qualify of ITO thin films prepared on polymeric substrates. Furthermore, the material, electrical and optical properties of as-deposited ITO films are dominated by the ratio of oxygen partial pressure. As the experimental results the surface roughness of ITO films becomes rough as the oxygen partial pressure Increases. The electrical resistivity of as-deposited ITO films decreases initially, and then increases with the increase of oxygen partial pressure. The optical transmittance at visible wavelength for all polymeric substrates is above 80%.