한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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- Pages.699-702
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- 2004
대면적 SPL(Scanning Probe Lithography) 시스템 제작
Manufacturing of SPL system having a large scanning area
- Yoon, Sang-Joon (KyungHee Univ.) ;
-
Kim, Won-Hyo
(KETI)
;
-
Seong, Woo-Kyeong
(KETI)
;
-
Park, Young-Geun
(M2N Inc.)
;
- Hwang, Kyu-Ho (M2N Inc.) ;
- Chung, Kwan-Soo (KyungHee Univ.)
- 발행 : 2004.11.11
초록
Next generation lithography technologies, such as EBL(Electron Beam Lithography), X-ray lithography, SPL(Scanning Probe Lithography), have been studied widely for getting over line width limitation of photolithography. Among the next generation lithography technologies, SPL has been highlighted because of its high resolution advantage. But is also has problem which are slow processing time and sample size limitation. The purpose of this study is complement of present SPL system. Brand new SPL system was made. SPL test was performed with the system in ultra thin PMMA(polymethlymethacrylate) film.