Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2004.11a
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- Pages.268-270
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- 2004
Fabrication of Glass Etching Mask using Various Polymers and Metals and Test of it in Glass Micromaching
폴리머와 금속을 이용한 유리 식각 마스크의 저작 및 이를 이용한 유리 가공
- Jeon, Do-Han (School of Electronics Engineering, Ajou University) ;
- Sim, Woo-Young (School of Electronics Engineering, Ajou University) ;
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Yang, Sang-Sik
(School of Electronics Engineering, Ajou University)
- Published : 2004.11.05
Abstract
This paper reports a novel masking method with various mask materials for wet etching of glass. Various mask materials such as Cr/Au, Ti/Au, Polyimide and thick SU-8 photoresist were investigated for borosilicate glass (Borofloat33) etching in concentrated hydrofluoric acid (48% HF). Polyimide and thick SU-8 photoresist are not suitable as masking material due to its poor adhesion to glass surfaces. Titanium has good adhesion is suitable as the first layer to make multi-protective layers. The best protection was obtained with a combination of Ti/Au, polyimide and Ti/Au as masking material with etch depth of
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