Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2004.11a
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- Pages.98-100
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- 2004
Etching characteristics of PST thin film and ion energy distribution using inductively coupled plasma
유도결합 플라즈마를 이용한 PST 박막의 식각 특성 및 이온 에너지 분포
- Kim, Gwan-Ha (ChungAng University) ;
- Kim, Kyoung-Tae (ChungAng University) ;
- Kim, Chang-Il (ChungAng University)
- Published : 2004.11.05
Abstract
In this study, PST thin films were etched with inductively coupled
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