Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2004.11a
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- Pages.72-74
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- 2004
The etching properties of $Al_2O_3$ thin films in $N_2/Cl_2/BCl_3$ and Ar/$Cl_2/BCl_3$ gas chemistry
유도결합 플라즈마를 이용한 $Al_2O_3$ 식각 특성
- Koo, Seong-Mo (Chung-Ang Univ.) ;
- Kim, Dong-Pyo (Chung-Ang Univ.) ;
- Kim, Kyoung-Tae (Chung-Ang Univ.) ;
- Kim, Chang-Il (Chung-Ang Univ.)
- Published : 2004.11.05
Abstract
In this study, we used a inductively coupled plasma (ICP) source for etching
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