Proceedings of the Korean Society Of Semiconductor Equipment Technology (한국반도체및디스플레이장비학회:학술대회논문집)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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적응성 유한체적법을 적용한 다차원 확산공정 모델링

  • 이준하 (상명대학교 컴퓨터시스템공학 정보디스플레이연구소) ;
  • 이흥주 (상명대학교 컴퓨터시스템공학 정보디스플레이연구소) ;
  • 변기량 (중앙대학교 전자공학과 차세대나노기술연구실)
  • Published : 2004.05.01
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Abstract

This paper presents a 3-dimensional diffusion simulation with adaptive solution strategy. The developed diffusion simulator VLSIDIF-3 was designed to re-refine areas where difference of doping concentration between any of two nodes of each element is greater than tolerance and redo diffusion process until error is tolerable. Numerical experiment in low doping diffusion problem showed that this adaptive solution strategy is very efficient in both memory and time, and expected this scheme would be more powerful in complex diffusion model.

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