Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 2004.06b
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- Pages.497-500
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- 2004
Photolithography process investment of water soluble photoresist and Organic thin film by using it.
수용성 포토레지스트와 이를 이용한 유기 박막의 photolithography 공정 연구
- Kim, Kwang-Hyun (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
- Kim, Gun-Ju (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
- Ryu, Ki.-Sung (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
- Kim, Tae-Ho (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
- Song, Jung-Kun (Division of Electric at & Electronics & Computer Engineering Dong-A University)
- 김광현 (동아대학교 전기전자컴퓨터공학부) ;
- 김건주 (동아대학교 전기전자컴퓨터공학부) ;
- 류기성 (동아대학교 전기전자컴퓨터공학부) ;
- 김태호 (동아대학교 전기전자컴퓨터공학부) ;
- 송정근 (동아대학교 전기전자컴퓨터공학부)
- Published : 2004.06.01
Abstract
In this paper, we developed a new photolithography process which used a water-soluble photoresist instead of organic solvent soluble photoresist, defined pentacene thin film. And pentacene OTFTs were fabricated with the water- soluble photolithography process.
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