The characteristic carrier-Er interaction distance in Er-doped a-Si/SiO2 superlattices formed by ion sputtering

  • Jhe, Ji-Hong (Dept. of Physics, Korea Advanced Institute of Science and Technology(KAIST)) ;
  • Shin, Jung-H. (Dept. of Physics, Korea Advanced Institute of Science and Technology(KAIST)) ;
  • Kim, Kyung-Joong (Nano Surface Group, Korea Research Institute of Standard and Science(KRISS)) ;
  • Moon, Dae-Won (Nano Surface Group, Korea Research Institute of Standard and Science(KRISS))
  • Published : 2003.02.14