Preparation of Metallic Cu Thin Films by MOCVD Using Novel Organometallic Cu(II) Precursors

  • Lee, Sun-Sook (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Park, Jung-Woo (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Chung, Taek-Mo (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Kim, Chang-Gyoun (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Kim, Yun-Soo (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology)
  • Published : 2003.02.14