Proceedings of the KSME Conference (대한기계학회:학술대회논문집)

The Korean Society of Mechanical Engineers (대한기계학회)
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UV transparent stamp fabrication for UV nanoimprint lithography

UV 나노임프린트 리소그래피용 UV 투과성 나노스탬프 제작

  • 정준호 (한국기계연구원 지능형정밀기계연구부) ;
  • 심영석 (한국기계연구원 지능형정밀기계연구부) ;
  • 손현기 (한국기계연구원 지능형정밀기계연구부) ;
  • 신영재 (한국기계연구원 지능형정밀기계연구부) ;
  • 이응숙 (한국기계연구원 지능형정밀기계연구부) ;
  • 허익범 (듀폰포토마스크(주) 기술부) ;
  • 권성원 (듀폰포토마스크(주) 기술부)
  • Published : 2003.04.23
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Abstract

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A $5{\times}5{\times}0.09$ inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and discuss the results including SEM images.

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