Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.04a
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- Pages.88-91
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- 2003
Annealing effect of Si nanocrystallites thin films
실리콘 나노결정 박막의 후열처리 효과 연구
- Jeon, Kyung-Ah (Department of Electrical and Electronic Engineering, Yonsei University) ;
- Kim, Jong-Hoon (Department of Electrical and Electronic Engineering, Yonsei University) ;
- Choi, Jin-Baek (Department of Electrical and Electronic Engineering, Yonsei University) ;
- Lee, Sang-Yeol (Department of Electrical and Electronic Engineering, Yonsei University)
- Published : 2003.04.19
Abstract
Si nanocrystallites thin films have been fabricated by pulsed laser deposition using a Nd:YAG laser. After deposition, samples were annealed at the temperature range of 400 to