한국정보디스플레이학회:학술대회논문집
- 2003.07a
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- Pages.1131-1134
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- 2003
Development of a Low Temperature Doping Technique for Application in Poly-Si TFT on Plastic Substrates
- Hong, Wan-Shick (Dept. of Electronics Engineering, Sejong University) ;
- Kim, Jong-Man (Dept. of Electronics Engineering, Sejong University)
- Published : 2003.07.09
Abstract
A low temperature doping technique has been studied for application in poly-Si TFT's on plastic substrates. Heavily-doped amorphous silicon layers were deposited on poly-Si and the dopant atoms were driven in by subsequent excimer laser annealing. The entire process was carried out under a substrate temperature of
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