한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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- Pages.360-363
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- 2003
$N_2$ 플라즈마를 이용한 TFT-FRAM용 $SiN_x$ 버퍼층의 특성 개선
Improved SiNx buffer layer by Using the $N_2$ Plasma Treatment for TFT-FRAM applications
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Lim, Dong-Gun
(Chungju National University) ;
- Yang, Kea-Joon (Chungju National University) ;
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Yi, Jun-Sin
(Sungkyunkwan Unversity)
- 발행 : 2003.11.13
초록
In this paper, we investigated SiNx film as a buffer layer of TFT-FRAM. Buffer layers were prepared by two step process of a