한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

표면탄성파 필터 제작을 위한 Pt 박막 식각

Etching of Pt Thin Film for SAW Filter Fabrication

  • 최용희 (인하대학교 정보통신공학과 m-Parc) ;
  • 송호영 (인하대학교 정보통신공학과 m-Parc) ;
  • 박세근 (인하대학교 정보통신공학과 m-Parc) ;
  • 이택주 (인하대학교 정보통신공학과 m-Parc) ;
  • 오범환 (인하대학교 정보통신공학과 m-Parc) ;
  • 이승걸 (인하대학교 정보통신공학과 m-Parc) ;
  • 이일항 (인하대학교 정보통신공학과 m-Parc)
  • Choi, Yong-Hee (Department of Information and Communication Engineering, m-Parc, Inha University) ;
  • Song, Ho-Young (Department of Information and Communication Engineering, m-Parc, Inha University) ;
  • Park, Se-Geun (Department of Information and Communication Engineering, m-Parc, Inha University) ;
  • Lee, Taek-Joo (Department of Information and Communication Engineering, m-Parc, Inha University) ;
  • O, Beom-Hoan (Department of Information and Communication Engineering, m-Parc, Inha University) ;
  • Lee, Seung-Gol (Department of Information and Communication Engineering, m-Parc, Inha University) ;
  • Lee, El-Hang (Department of Information and Communication Engineering, m-Parc, Inha University)
  • 발행 : 2003.11.13
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초록

The inductively coupled plasma(ICP) etching process was selected to fabricate RF Surface Acoustic Wave(SAW) filters and a Pt thin film was sputtered on a $LiTaO_3$ substrate applied to electrode materials to reduce the spurious response and improve the power durability. Steep sidewall pattern was achieved employing $C_4F_8/Ar/Cl_2$ gas chemistry. We investigated an etching mechanism and parameter dependence of the Pt thin film about $C_4F_8$ addition. Sidewall etch angle was about $80^{\circ}$ at the $C_4F_8$ 20% mixing ratio. Fabricated SAW filter is consists of some series and parallel arm SAW resonators which work as impedance elements and show capacitance characteristics at out of the passband. It can be modified for $800{\sim}900\;MHz$ RF filters. External matching circuits were unnecessary.

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