Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07b
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- Pages.1176-1179
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- 2003
Analysis of Electrical Properties of Ar Gas According to Input Pressure for Inductively Coupled Plasma
유도결합형 플라즈마에서 압력에 따른 Ar Gas의 전기적 특성분석
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Jo, Ju-Ung
(Wonkwang Univ.) ;
- Lee, Y.H. (Wonkwang Univ.) ;
- Her, In-Sung (Wonkwang Univ.) ;
- Kim, Kwang-Soo (Wonkwang Univ.) ;
- Choi, Yong-Sung (Wonkwang Univ.) ;
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Park, Dea-Hee
(Wonkwang Univ.)
- Published : 2003.07.10
Abstract
Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56 [MHz] have been measured over a wide range of power at gas pressure ranging from