Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2003.10a
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- Pages.322-325
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- 2003
Etching characteristics of BST thin films using $BCl_3/Cl_2$ /Ar plasma
$BCl_3/Cl_2$ /Ar 플라즈마를 이용한 BST 박막의 식각 특성
- Kim, Gwan-Ha (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Dong-Pyo (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Chang-Il (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Lee, Chul-In (Dept. of Electrical Engineering, Ansan College of Technology) ;
- Kim, Tae-Hyung (Dept. of Electric System Designs, YeoJoe Institute of Technology)
- 김관하 (중앙대학교 전자전기공학부) ;
- 김동표 (중앙대학교 전자전기공학부) ;
- 김창일 (중앙대학교 전자전기공학부) ;
- 이철인 (안산공과대학 전기과) ;
- 김태형 (여주대학 전기시스템디자인과)
- Published : 2003.10.31
Abstract
BST thin films were etched with inductively coupled plasmas. A chemically assisted physical etch of BST was experimentally confirmed by ICP under various gas mixtures. After a 20 % addition of
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