낮은 정전용량을 가진 실리콘 광학벤치를 제작하기 위한 적층구조 방법

Multi-layer Structure Method for Manufacturing SiOB with Low Capacitance

As the demand for high frequency(bandwidth) optical module is increased, there is a need for fabricating silicon optical bench(SiOB) with low parasitic impedance. In this paper, we discuss multi-layer structure method for manufacturing SiOB with low capacitance. This structure method decreases the capacitance between the conductive patterns for about 94∼97％ compared to the conventional structure without raising the resistivity of silicon, or increasing the thickness of the dielectric film.