AFM을 이용한 PMMA (Poly Methy1 Methacrylate) 박막의 나노트라이볼로지 연구

Nanotribology of PMMA thin film using the AFM

  • 김승현 (국민대학교 신소재공학부) ;
  • 김용석 (국민대학교 신소재공학부)
  • 발행 : 2003.10.01

초록

Nano-scratch tests were performed on PMMA thin films spin-coated on a Si substrate using an atomic force microscopy (AFM) with loads ranging from 10nN to 100nN. At low applied loads, a ridge pattern was formed on the PMMA surface. No wear particles were observed during the pattern-forming mild wear. At high applied loads, severe wear occurred accompanied by wear particles. The film with the highest hardness showed the highest wear resistance. Friction force generated during the Scratching was closely related with surface deformation of the film.

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