The Effects of Film Thickness on the Dipolar Relaxation of $PbTiO_3$ Thin Films in the Microwave-Frequency Range

마이크로파 대역에서 $PbTiO_3$ 박막의 Dipolar Relaxation에 대한 박막 두께의 효과

  • 이도영 (서울대학교 재료공학부) ;
  • 김용조 (서울대학교 재료공학부)
  • Published : 2003.11.01

Abstract

The effects of film thickness on the dipolar relaxation of ferroelectric PbTiO$_3$ films were investigated in the microwave-frequency range. The dielectric constants ($\varepsilon$) and the dielectric losses (tan $\delta$) were successfully measured up to 30 ㎓ using interdigital capacitors. The PbTiO$_3$ thin films were deposited on the quartz substrate at room temperature and postannealed in oxygen atmosphere. As the film thickness increased, its grain size and tetragonality were enhanced. And the dipolar relaxation behavior began to appear in the thin films with approximately 20 nm thickness, since ferroelectric domains could not be formed hi small grains. The observed relaxation frequency (above 10 ㎓) was higher than the previous values reported in bulk ceramics. It can be correlated with the extremely small domain size of the thinfilms as shown by TEM. And, the Rayleigh constant [1] from domain wall motions was alsoinvestigated by LCR meter at 100 KHz.

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