Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2003.11a
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- Pages.131-131
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- 2003
Phenyl modified silica sol-gel films for photonics
Photonic 재로로서 페닐실리카 코팅막의 특성
- Ahn, Bok-Yeop (Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
- Seok, Sang-Il (Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
- Kim, Joo-Hyeun (Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
- Lim, Mi-Ae (Advanced Materials Division, Korea Research Institute of Chemical Technology)
- Published : 2003.11.01
Abstract
The advent of photonic technologies in the field of communications and data transmission has been heavily increasing the demand in integrated optical (IO) circuits capable of accomplishing not only simple tasks like signal, but also more sophisticated functions like all-optical signal routing or active multiplexing/demultiplexing. In the last decade, sol-gel technology has been widely used to prepare optical materials. Sol-gel processes show many promises for the development of low-loss, high-performance glass integrated optical circuits. However, crack formation is likely to occur during heat treatment in thick gel films. In order to overcome the critical thickness limitation, the organic-modified silicate has been widely used. In this case coating matrices have been prepared from the organo-silanes of T structures, acidic catalyst and the as-prepared gel films have been heat-treated below 200
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