Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2003.05a
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- Pages.61-61
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- 2003
Study on the Microstructure of Trivalent Chrome Layers b AFM and SANS
- Choi, Y. (Sunmoon University) ;
- Lee, J.J. (Sunmoon University) ;
- Lee, B.K. (Sunmoon University) ;
- Kim, M. (Korea Institute of Machinery and Materials) ;
- Kwon, S.C. (Korea Institute of Machinery and Materials) ;
- Seung, B.S. (HANARO Center, Korea Atomic Energy Research Institute)
- Published : 2003.05.01
Abstract
It is important to know SIze distribution of defects In electroplated trivalent chrome layers because it significantly influences on performance of the layers. Most of the nano-scale defects are able to be introduced by hydrogen evolution during the plating. Little information is available on the nano-size defects. In this study, SANS was applied to determine the size distribution of nano-scale defects in the trivalent chrome layers prepared in a formate bath. The defect size and distribution was dependent upon plating conditions such as current density and applied voltage. SANS is one of useful techniques to determine the nano-scale defect in the electroplated layers.
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