Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2003.05a
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- Pages.57-57
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- 2003
Etching characteristics of Ta using $Ar/Cl_2$ inductively coupled plasma
유도결합형 플라즈마를 이용한 Ta 식각 특성
Abstract
Keywords