Tunneling magnetoresistance of AIN/Co/AlN type discontinuous films

  • Yang C.J. (Electromagnetic Materials Laboratory, Research Institute of Industrial Science and Technology (RIST)) ;
  • Zhang M. (Electromagnetic Materials Laboratory, Research Institute of Industrial Science and Technology (RIST), Institute of Metal Research, Academic Sinica) ;
  • Zhang Z. D. (Institute of Metal Research, Academic Sinica) ;
  • Han J. S. (Electromagnetic Materials Laboratory, Research Institute of Industrial Science and Technology (RIST))
  • Published : 2003.12.01