Proceedings of the KIPE Conference (전력전자학회:학술대회논문집)
- 2003.07a
- /
- Pages.260-263
- /
- 2003
2MHz, 2kW RF Generator
2MHz, 2kW RF 전원장치
- Lee J.H. (New Power Plasma Co) ;
- Choi D.K. (New Power Plasma Co) ;
-
Choi S.D.
(New Power Plasma Co)
;
- Choi H.Y. (New Power Plasma Co) ;
-
Won C,Y.
(Sungkyunkwan Univ)
;
- Kim S.S (Seoul National Univ. of Technology)
- 이정호 ((주)뉴파워프라즈마) ;
- 최대규 ((주)뉴파워프라즈마) ;
-
최상돈
((주)뉴파워프라즈마)
;
- 최해영 ((주)뉴파워프라즈마) ;
-
원충연
(성균관대학교)
;
- 김수석 (서울산업대학교)
- Published : 2003.07.01
Abstract
When ICP(Inductive Coupled Plasma type etching and wafer manufacturing is being processed in semiconductor process, a noxious gas in PFC and CFC system is generated. Gas cleaning dry scrubber is to remove this noxious gas. This paper describes a power source device, 2MHz switching frequency class 2kW RF Generator, used as a main power source of the gas cleaning dry scrubber. The power stage of DC/DC converter is consist of full bridge type converter with 100kHz switching frequency Power amplifier is push pull type inverter with 2MHz switching frequency, and transmission line transformer. The adequacy of the circuit type and the reliability of generating plasma in various load conditions are verified through 50
Keywords