한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2002년도 제23회 학술발표회 초록집
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- Pages.152-153
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- 2002
Deposition and characterization of Ti-Al-N thin films deposited by plasma-assisted atomic layer deposition
- Lee, Yong-Ju (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST)) ;
- Kang, Sang-Won (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST))
- 발행 : 2002.06.27