Effect of Surface etching on Magnetoresistance of GMR Multilayer

GMR 다층박막에서 표면 에칭에 따른 자기저항변화 효과

  • Published : 2002.04.25

Abstract

Magnetoresistance (MR) of mumetal/Co/Co/Co multilayer is measured as a function of surface etching on the top Co layer by ion beam etching system. As the etching process proceeds, Co thickness and roughness decreases. MR is dominantly affected by Co layer thickness, but surface roughness makes no significant effect on the MR of mumetal/Co/Cu/Co multilayer.

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