한국정보디스플레이학회:학술대회논문집
- 2002.08a
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- Pages.694-696
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- 2002
Behavior of catalyst layer during the growth of carbon nanotubes for field emission application by thermal chemical vapor deposition
- Park, Jong-Bong (Dept. of Materials Engineering, Chungnam National University) ;
- Kim, Do-Jin (Dept. of Materials Engineering, Chungnam National University) ;
- Choi, Sung-Yool (Basic Research Lab., Electronics and Telecommunications Research Institute (ETRI)) ;
- Ahn, Seong-Deok (Basic Research Lab., Electronics and Telecommunications Research Institute (ETRI)) ;
- Lee, Jin-Ho (Basic Research Lab., Electronics and Telecommunications Research Institute (ETRI))
- Published : 2002.08.21
Abstract
Growth behaviors of carbon nanotubes (CNTs) are studied in terms of catalyst by using scanning electron microscopy and transmission electron microscope (TEM). Catalyst films deposited on various substrates are agglomerated into nano-islands during the heat-up to the growth temperature. In particular, we focus on the direct investigation of the microstructures of the CNTs and the interface of CNTs-catalyst-substrate using cross-sectional TEM. We investigate relationship to the subsequent CNTs growth on each nucleation site. The growth of CNTs depends on the catalyst itself but not the silicide formation between the catalyst and the substrate.
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