제어로봇시스템학회:학술대회논문집
- 2002.10a
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- Pages.46.5-46
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- 2002
Wavelet Characterization of Profile Uniformity Using Neural Network
- Park, Won-Sun (Korea Univ.) ;
- Lim, Myo-Teak (Korea Univ.) ;
- Kim, Byungwhan (Sejong Univ.)
- Published : 2002.10.01
Abstract
As device dimension shrinks down to sub 100nm, it is increasingly important to monitor plasma states. Plasma etching is a key means to fine patterning of thin films. Many parameters are involved in etching and each parameter has different impact on process performances, including etch rate and profile. The uniformity of etch responses should be maintained high to improve device yield and throughput. The uniformity can be measured on any etch response. The most difficulty arises when attempting to characterize etched profile. Conventionally, the profile has been estimated by measuring the slope or angle of etched pattern. One critical drawback in this measurement is that this is unable to cap...
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