Flow behavior at the embossing stage of nanoimprint lithography

나노임프린트리소그래피의 엠보싱 과정에서의 흐름거동

Jeong, Jun-Ho (Korea Institute of achinery and materials, Department of Intelligent Precision Machine) ;
Park, Yun-Suk (KyungWon Tech Corporation) ;
Shin, Yung-Jae (Korea Institute of Machinery and materials, Department of Intelligent Precision Machine) ;
Lee, Jae-Jong (Korea Institute of Machinery and materials, Department of Intelligent Precision Machine) ;
Park, Kyoung-Taik (Korea Institute of Machinery and materials, Department of Intelligent Precision Machine) ;
Lee, Eung-Sug (Korea Institute of Machinery and materials, Department of Intelligent Precision Machine) ;
Lee, Sang-Rok (Korea Institute of Machinery and materials, Department of Intelligent Precision Machine)

No Abstract, See Full Text