Development of a Monte Carlo Simulator for Electron Beam Lithography in Multi-Layer Resists and Multi-Layer Substrates

다층 리지스트 다층 기판 구조에서의 전자빔 리소그래피 공정을 위한 몬테카를로 시뮬레이터의 개발

We have developed a Monte Carlo (MC) simulator for electron beam lithography in multi-layer resists and multi-layer substrates in order to fabricate and develop high-speed PHEMT devices for millimeter- wave applications. For the deposited energy calculation to multi-layer resists by electron beam in MC simulation, we modeled newly for multi-layer resists and heterogeneous multi-layer substrates. Using this model, we simulated T-gate or r-gate fabrication process in PHEMT device and showed our results with SEM observations.