한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2002년도 하계학술대회 논문집
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- Pages.326-329
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- 2002
금속씨앗층과 $N_2$ 플라즈마 처리를 통한 Al/CeO$_2$ /Si 커패시터의 유전 및 계면특성 개선
Improvement of dielectric and interface properties of Al/CeO$_2$ /Si capacitor by using the metal seed layer and $N_2$ plasma treatment
초록
In this paper, we investigated a feasibility of cerium oxide(CeO