Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2001.07a
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- Pages.153-154
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- 2001
Reactive ion etching of GaAs, AIGaAs, and InGaP in $Cl_2$ and $CCl_2F_2$ plasmas with Ar and $H_2$ addition
- Yu, Jae-Su (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Bae, Seong-Ju (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Song, Jin-Dong (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Kang, Young-Shik (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Lee, Yong-Tak (Department of Information & Communications, Kwanju Institute of Science & Technology)
- Published : 2001.07.05
Abstract
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