Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2001.07a
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- Pages.74-74
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- 2001
Thermal stability and the formation mechanism of the interfacial layer between WNx/Si(100)
- Choi, I.S. (Hynix Semiconductor Inc.) ;
- Park, J.C. (Hynix Semiconductor Inc.) ;
- Choi, J.T. (Hynix Semiconductor Inc.) ;
- Kim, H.J. (Hynix Semiconductor Inc.) ;
- Lee, S.Y. (Hynix Semiconductor Inc.)
- Published : 2001.07.05
Abstract
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