한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2001년도 제21회 학술발표회 초록집
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- Pages.71-71
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- 2001
A study of MOS ehayaeteristics of reoxidized $HfO_2$ thin film for gate oxide applications
- Lee, Dong-Won (Department of Ceramic Engineering, Yonsei University) ;
- Choi, Hyo-Jick (Department of Ceramic Engineering, Yonsei University) ;
- Nam, Seok-Woo (Department of Ceramic Engineering, Yonsei University, R&D Center Semiconductor Samsung Electronics Co.) ;
- Nam, Su-Heun (Department of Ceramic Engineering, Yonsei University) ;
- Ko, Dae-Hong (Department of Ceramic Engineering, Yonsei University)
- 발행 : 2001.07.05