한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2001년도 제21회 학술발표회 초록집
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- Pages.54-54
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- 2001
Growth behavior and structural properties of titanium dioxide thin films on Si(100) and Si(111) substrates using single molecular precursor by high vacuum MOCVD
- Jung, C.K. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Kang, B.C. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Chae, H.Y. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Kim, Y.S. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Seo, M.K. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Kim, S.K. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Lee, S.B. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Boo, J.H. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
- Moon, Y.J. (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
- Lee, J.Y. (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology)
- 발행 : 2001.07.05