Growth of $TiO_{2}$ Thin Films on Si(100) and Si(111) Substrates Using Single Molecular Precursor by MOCVD and Comparision of Growth Mechanism and Structural Properties

  • Jung, C.K. (Department of Chemistry, Sungkyunkwan University) ;
  • Kang, B.C. (Department of Chemistry, Sungkyunkwan University) ;
  • Chae, H.Y. (Department of Chemistry, Sungkyunkwan University) ;
  • Lee, S.B. (Department of Chemistry, Sungkyunkwan University) ;
  • Boo, J.H. (Department of Chemistry, Sungkyunkwan University)
  • Published : 2001.02.22