한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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- Pages.509-512
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- 2001
RF Magnetron Sputtering 법으로 증착된 AlN 박막의 특성
Characteristics of AlN thin film using RF Magnetron Sputtering
- 발행 : 2001.11.08
초록
Aluminum nitride(AlN) thin films were deposited on silicon substrates using RF magnetron sputtering at various deposition conditions and investigated the characteristics. It was used XRD, AES, SEM, and HP-4145B semiconductor parameter analyzer to analysis deposited AlN thin films. The deposition conditions for the good c-axis orientation were 100 W of RF power,