Characteristics variation of CoCrTa/Si double layer thin film on variation of underlayer substrate temperature

하지층기판온도에 따른 CoCrTa/Si 이층박막의 특성변화

  • 박원효 (경원대학교 공대 전지전자공학부) ;
  • 김용진 (경원대학교 공대 전지전자공학부) ;
  • 금민종 (경원대학교 공대 전지전자공학부) ;
  • 가출현 (경원대학교 공대 전지전자공학부) ;
  • 손인환 (신성대학 전기과) ;
  • 최형욱 (경원대학교 공대 전지전자공학부) ;
  • 김경환 (경원대학교 공대 전지전자공학부)
  • Published : 2001.11.08

Abstract

Crystallographic and magnetic characteristics of CoCr-based magnetic thin film for perpendicular magnetic recording media were influenced on preparing conditions. In these, there is that substrate temperature was parameter that increases perpendicular coercivity of CoCrTa magnetic layer using recording layer. While preparation of CoCr-based doublelayer, by optimizing substrate temperature, we expect to increase perpendicular anisotropy of CoCr magnetic layer and prepare ferromagnetic recording layer with a good quality by epitaxial growth. CoCrTa/Si doublelayer showed a good dispersion angle of c-axis orientation $\Delta\theta_{50}$ caused by inserting amorphous Si underlayer which prepared at underlayer substrate temperature 250C. Perpendicular coercivity was constant, in-plane coercivity was controlled a low value about 200Oe. This result implied that Si underlayer could restrain growth of initial layer of CoCrTa thin film, which showed bad magnetic properties effectively without participating magnetization patterns of magnetic layer. In case of CoCrTa/Si that prepared with ultra thin underlayer, crystalline orientation of CoCrTa was improved rather underlayer thickness 1nm, it was expected that amorphous Si layer played a important role in not only underlayer but also seed layer.

Keywords