2단계 증착법을 이용하여 증착한 ZnO 박막의 열처리 효과 분석

Characterization of Heat Treatment Effects on ZnO Films Deposited by Two-step Method

  • Lee, Jin-Bock (Dep. of Electrical Engineering, Hanyang University) ;
  • Lee, Myung-Ho (Dep. of Electrical Engineering, Hanyang University) ;
  • Lee, Hye-Jung (Dep. of Electrical Engineering, Hanyang University) ;
  • Park, Jin-Seok (Dep. of Electrical Engineering, Hanyang University)
  • 발행 : 2001.11.03

초록

ZnO thin films are deposited on $SiO_2$/Si (111) substrate by RF magnetron sputtering. The two-step deposition method is proposed to enhance both the c-axis orientation and the resistivity of ZnO films. This method consists of the following two procedures: the 1 st-deposition for 30 min without oxygen at l00W and the 2nd-deposition with oxygen added in the range of $O_2/(Ar+O_2)=10{\sim}50%$. Effects of thermal treatment on the properties of ZnO films are systematically investigated.

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