The conceptual design of the x y $\theta$ fine stage and its optimal design to obtain fast response in lithography system.

The quality of a precision product, in genera, relies on the accuracy and precision of its manufacturing and inspection process. In many cases, the level of precision in the manufacturing and inspection system is also dependent on the positioning capability of tool with respect to the workpiece in the process. Recently the positioning accuracy level employed for some of precision product has reached the level of submicron and long range of motion is required. For example, for 1GDRM lithography, 20nm accuracy and 300nm stroke needs. This paper refers to the lithography stage especially fine stage. In this study, for long stroke and high accuracy, the dual servo system is proposed. For the coarse actuator, LDM(Linear DC Noter) is used and for fine or VCM is used ...