한국산학기술학회:학술대회논문집 (Proceedings of the KAIS Fall Conference)
- 한국산학기술학회 2001년도 춘계학술대회 발표논문집
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- Pages.124-128
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- 2001
전리수를 이용한 Si 웨이퍼 세정의 IR 특성연구
A Study on IR Characterization of Electrolyzed Water for Si Wafer Cleaning
초록
A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature Process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as functional water cleaning are being studied. The electrolyzed water was generated by an electrolysis system which consists of anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH
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