대한전자공학회:학술대회논문집 (Proceedings of the IEEK Conference)
- 대한전자공학회 2001년도 하계종합학술대회 논문집(2)
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- Pages.37-40
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- 2001
자화주파수에 따른 플라즈마 및 산화막식각특성에 관한 연구
Magnetization Frequency Dependence of Enhanced Inductively Coupled Plasma and Etching Characteristics
초록
The semiconductor's design rule becomes more stringent, hence the silicon-dioxide etching technique is important issue. In this work we compared the etching characteristics of different three types of Plasma source, Normal ICP, magnetized ICP and E-IC
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