Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.11a
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- Pages.558-561
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- 2001
A new fabrication process of vanadium oxides($VO_{x}$ ) thin films showing high TCR and low resistance for uncooled IR detectors
- Han, Yong-Hee (Division of Material Science and Engineering, Korea University) ;
- Kang, Ho-Kwan (Micro System Research Center, KIST) ;
- Moon, Sung-Uk (Micro System Research Center, KIST) ;
- Oh, Myung-Hwan (Micro System Research Center, KIST) ;
- Park, In-Hoon (Division of Material Science and Engineering, Korea University)
- Published : 2001.11.01
Abstract
Vanadium oxide (
Keywords
- Vanadium oxide ($VO_{x}$);
- Temperature Coefficient of Resistance (TCR);
- Bolometer;
- and Infrared (IR) detector