Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.11a
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- Pages.537-540
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- 2001
Characteristic of Tantalum Nitride Thin-films for High Precision Resistors
고정밀 저항용 질화탄탈 박막의 특성
Abstract
This paper presents the characteristics of Ta-N thin-(ibm for high precision resistors, which were deposited oni substrate by DC reactive magnetorn sputtering in an argon-nitrogen atmosphere(Ar-(4∼16%)N