Fabrication of amorphous carbon thin film using laser ablation technique

레이저 층착법에 의한 비정질 탄소계 박막의 제작

  • ;
  • ;
  • ;
  • K. Oura
  • 류정탁 (대구대학교 정보통신공학부) ;
  • 김연보 (대구대학교 정보통신공학부) ;
  • 조경제 (대구대학교 중앙기기센터) ;
  • Published : 2001.11.01

Abstract

Amorphous carbon thin films were deposited using laser ablation technique on Si(100) substrates at different temperatures. In this study, effects of the substrate temperature on the properties of amorphous carbon films were systematically investigated. The surface morphologic and structural properties of the films were studied by scanning electron microscopy (SEM) and raman spectroscope, respectively. With increasing of the substrate temperature, the surface morphologies were changed singnificantly. Moreover the intensity ratio of D-band and G-band and the full width at half maximum of these bands were dependent on substrate temperatures.

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