Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.07a
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- Pages.632-635
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- 2001
A Study on the Plasma Enhanced Hot-wire CVD Grown Miorocrystalline Silicon Films for Photovoltaic Device Applications
태양전지 응용을 위한 플라즈마 열선 화학기상증착법으로 성장한 미세결정 실리콘에 관한 연구
Abstract
Microcrystalline Si films have been deposited by using five W-wire filaments of 0.5 mm diameter for hot-wire chemical vapor deposition (HWCVD). We compared the HWCVD grown films with the film exposed to transformer couple plasma system for the modification of seed layer. W-wire filament temperature was maintained below 1600