대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2001년도 하계학술대회 논문집 C
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- Pages.1533-1536
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- 2001
고주파-마이크로파 2단계 공정에 의한 다이아몬드 막의 성장
Growth of diamond films by RF-MW two step process
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Park, Sang-Hyun
(Kyungnam University)
;
- Woo, Bog-Man (Kyungnam University) ;
- Park, Jae-Yoon (Kyungnam University) ;
- Lee, Sang-Hee (KITECH) ;
- Lee, Duk-Chul (Inha university)
- 발행 : 2001.07.18
초록
To grow the diamond films by using RF-MW two step process, at first, diamond seeds were deposited on silicon substrate by RF plasma CVD, and then a diamond layer grown by MW plasma CVD on the seeds. The grain-size of diamond films deposited by using RF-MW two step process was smaller and denser and also, crystallity of diamond film was better than those of the MW plasma CVD process. The deposited diamond films were analyzed by SEM(scanning electron microscophy), XRD (x-ray diffraction), and Raman spectroscopy.
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